This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Halio, Inc.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: The Innovations of John Gallipeo
Introduction
John Gallipeo is an accomplished inventor based in Hayward, California. He has made significant contributions to the field of electrochromic devices, particularly in the design and functionality of integrated glazing units. His innovative approach has led to the development of a patented technology that enhances the performance of electrochromic assemblies.
Latest Patents
John Gallipeo holds a patent for "Shear stress reduction in electrochromic device assemblies." This patent describes an electrochromic integrated glazing unit (IGU) that comprises an electrochromic lite, a glass lite, a spacer, and a sealant. The design allows for the first piece of carrier glass to extend farther than the second piece of carrier glass and the electrochromic device along a first edge of the electrochromic lite. This configuration improves the overall performance and durability of the electrochromic unit.
Career Highlights
Throughout his career, John has worked with notable companies such as Halio, Inc. and AGC Glass Europe. His experience in these organizations has allowed him to refine his skills and contribute to advancements in glazing technologies. His work has been instrumental in pushing the boundaries of what is possible in electrochromic applications.
Collaborations
John Gallipeo has collaborated with talented professionals in the industry, including Jonathan Vivier and Christophe Boonaert. These partnerships have fostered innovation and have led to the successful development of new technologies in the field.
Conclusion
John Gallipeo's contributions to the field of electrochromic devices exemplify the spirit of innovation. His patented technology and collaborative efforts have significantly impacted the industry, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
