South Attleboro, MA, United States of America

John G Panagou


Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 158(Granted Patents)


Location History:

  • Attleboro, MA (US) (1988)
  • South Attleboro, MA (US) (1993 - 1995)

Company Filing History:


Years Active: 1988-1995

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4 patents (USPTO):Explore Patents

Title: Innovations of John G Panagou

Introduction

John G Panagou is a notable inventor based in South Attleboro, MA (US). He has made significant contributions to the field of pressure sensors, holding a total of 4 patents. His work focuses on innovative methods that enhance the functionality and reliability of differential pressure sensors.

Latest Patents

One of his latest patents involves a method for removing sacrificial material through temporary channels. This method is utilized in the creation of an overpressure-protected differential pressure sensor. The sensor is formed by depositing diaphragm material over a cavity filled with sacrificial material. Once the sacrificial material is removed, a free diaphragm is created. The design includes a first pressure stop that limits the diaphragm's deflection in response to applied pressure. Additionally, a port is created to allow pressure to be applied to the bottom side of the diaphragm. An optional second pressure stop can also be included, which further limits the diaphragm's deflection.

Career Highlights

John G Panagou is currently associated with The Foxboro Company, where he continues to innovate in the field of pressure sensing technology. His expertise and inventions have contributed to advancements in sensor design and functionality.

Collaborations

Throughout his career, John has collaborated with talented individuals such as Clifford D Fung and Kevin H-l Chau. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

John G Panagou's contributions to the field of pressure sensors exemplify the spirit of innovation. His patents and collaborative efforts continue to influence advancements in sensor technology.

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