Jersey City, NJ, United States of America

John G Mc Kittrick


Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 83(Granted Patents)


Company Filing History:


Years Active: 1997-2010

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11 patents (USPTO):Explore Patents

Title: John G Mc Kittrick: Innovator in Coating Compositions

Introduction

John G Mc Kittrick is a notable inventor based in Jersey City, NJ (US). He has made significant contributions to the field of coating compositions, holding a total of 11 patents. His work primarily focuses on developing innovative solutions for inkjet printing applications.

Latest Patents

Among his latest patents is a coating composition designed for forming inkjet-receptive coatings on a substrate. This inkjet coating composition includes a combination of polydiallyldimethyl ammonium chloride (pDADMAC), a crosslinkable cationic polymer, colloidal silica, silica gel, a binder such as vinyl acetate-ethylene copolymer, and water. Another significant patent involves a process for making vinyl pyrrolidone/vinyl acetate copolymers with a very low residual vinyl pyrrolidone monomer level. This process allows for the production of copolymers with less than 100 ppm of residual monomer, preferably only 50 ppm, within a short production cycle by post-treating an aqueous solution of the copolymer at elevated temperatures under pressure.

Career Highlights

John G Mc Kittrick is currently associated with Isp Investments Inc., where he continues to innovate and develop new technologies. His extensive experience and expertise in the field have positioned him as a key player in the industry.

Collaborations

Throughout his career, John has collaborated with notable colleagues, including David K Hood and Michael A Tallon. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

John G Mc Kittrick is a distinguished inventor whose work in coating compositions has made a significant impact in the field of inkjet printing. His innovative patents and collaborations highlight his commitment to advancing technology in this area.

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