This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1993.
Company Filing History:
Years Active: 1993
Title: John G Forster: Innovator in Plasma Processing Technology
Introduction
John G Forster is a notable inventor based in Poughkeepsie, NJ (US). He has made significant contributions to the field of plasma processing, particularly in the optimization of helical resonators. His work is essential for enhancing the efficiency of semiconductor wafer processing.
Latest Patents
John G Forster holds a patent for an "Optimized helical resonator for plasma processing." This innovative resonator increases plasma density, which is crucial for efficient semiconductor wafer processing. The design is characterized by low inductance, resulting in a low Q factor. The first embodiment of his invention employs either distributed or lumped capacitance to minimize the value of .omega.L to less than about 200 Ohms. The second embodiment features a flat spiral coil that resonates as a 1/4 or 1/2 wave resonator. The third embodiment combines elements from the first two, utilizing both spiral and solenoid coils as the helical resonator.
Career Highlights
John G Forster is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects in the field of plasma processing. His expertise has been instrumental in advancing technologies that support semiconductor manufacturing.
Collaborations
Throughout his career, John has collaborated with notable colleagues, including John H Keller and Michael S Barnes. These partnerships have fostered innovation and have led to advancements in their respective fields.
Conclusion
John G Forster's contributions to plasma processing technology through his innovative patent demonstrate his commitment to enhancing semiconductor manufacturing. His work continues to influence the industry and showcases the importance of innovation in technology.