John Fritche

Title: Innovations by John Fritche

Introduction

John Fritche is a notable inventor based in New Paltz, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work primarily focuses on methods that enhance the manufacturing processes of integrated circuit devices.

Latest Patents

Fritche's latest patents include a "Method for forming damascene structure utilizing planarizing material coupled with diffusion barrier material." This invention addresses the manufacture of dual damascene interconnect structures in integrated circuit devices. The method involves forming a single or dual damascene structure in a low-k dielectric thin film by utilizing a planarizing material and a diffusion barrier material. In a preferred embodiment, vias are formed first in the dielectric material, followed by the deposition of the planarizing material in the vias and on the dielectric material. The barrier material is then deposited on the planarizing material. The trenches are formed lithographically, and the trench pattern is transferred to the dielectric material. This innovative method alleviates the problem of photoresist poisoning by the interlevel dielectric material.

Another significant patent is the "Method for reworking low-k polymers used in semiconductor structures." This method discloses a process for removing a dielectric layer formed upon a semiconductor substrate. In this exemplary embodiment, the dielectric layer is subjected to a dry etch process, while an adhesion promoter layer underneath the dielectric layer undergoes a wet etch process.

Career Highlights

John Fritche is associated with International Business Machines Corporation (IBM), where he has contributed to various projects in semiconductor technology. His expertise in the field has led to advancements that improve manufacturing efficiency and product reliability.

Collaborations

Fritche has collaborated with notable colleagues such as William C Wille and Daniel C Edelstein. Their combined efforts have fostered innovation and development in semiconductor processes.

Conclusion

John Fritche's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His innovative methods continue to influence the manufacturing processes of integrated circuit devices.