San Rafael, CA, United States of America

John F Schoeppel

This inventor holds 2 USPTO granted patents. Top assignee: Veriflo Corporation. Active years: 1991-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John F Schoeppel. Retrieved from https://idiyas.com/inventor/john-f-schoeppel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 1

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 1991-2000

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of John F. Schoeppel

Introduction

John F. Schoeppel, based in San Rafael, California, is a noteworthy inventor recognized for his contributions to the field of semiconductor manufacturing. With a total of two patents to his name, Schoeppel has made significant advancements that enhance the efficiency and cleanliness of processes critical to the industry.

Latest Patents

Schoeppel’s latest inventions include a **High Cv bulk process valve, control system and method**. This innovative valve facilitates the conveyance of process gases or liquids in semiconductor manufacturing. The design features an aerodynamically shaped expansion chamber that accommodates a valve seat and a moveable poppet to control fluid passage. Notably, this valve minimizes flow resistance, mirroring that of straight tubing, to ensure minimal energy consumption in semiconductor gas systems.

Another significant patent is the **Method and apparatus for cleaning surfaces to absolute or near-absolute cleanliness**. This method utilizes jets of heated cleaning solution, which continuously scrub and filter surfaces to remove over 99% of particles. The process not only proves effective for gas valves and related components but also extends its benefits to the health and pharmaceutical industries by providing sterile surfaces.

Career Highlights

John F. Schoeppel is an innovator at Veriflo Corporation, a firm deeply engaged in manufacturing equipment for the semiconductor industry. His groundbreaking patents contribute to the company’s reputation for high-quality standards and technical excellence. The impact of Schoeppel’s work is felt across various applications, enhancing the quality of manufacturing processes.

Collaborations

Throughout his career, Schoeppel has collaborated with notable coworkers, including Richard L. Martin and Harry Clay Nesbitt. These partnerships have likely fostered an environment of innovative thinking and problem-solving, leading to advancements that benefit not just their organization but also the broader field of semiconductor technology.

Conclusion

John F. Schoeppel’s inventive contributions make him a significant figure in the realm of semiconductors. His patents demonstrate a clear commitment to innovation, focusing on energy efficiency and cleanliness, crucial to modern manufacturing processes. As he continues to develop new technologies, Schoeppel’s work promises to drive further advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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