Company Filing History:
Years Active: 2023-2024
Title: John Elliott Ortmann, Jr.: Innovator in Molecular Beam Epitaxy
John Elliott Ortmann, Jr. is a notable inventor based in Palo Alto, CA (US). He has made significant contributions to the field of materials science, particularly in the fabrication of films using advanced techniques.
Latest Patents
Ortmann holds two patents, both focusing on the fabrication of films with controlled stoichiometry using molecular beam epitaxy. His innovative method involves growing a film using a deposition system and analyzing it with a Reflection High-Energy Electron Diffraction (RHEED) instrument. Data acquired from the RHEED instrument indicates the stoichiometry of the film. Ortmann's approach allows for real-time adjustments to the process parameters of the deposition system, ensuring precise control over the film's stoichiometry during subsequent depositions.
Career Highlights
Ortmann is currently employed at PsiQuantum Corp., where he continues to push the boundaries of technology in quantum computing and materials science. His work has been instrumental in advancing the understanding and application of molecular beam epitaxy in various industries.
Collaborations
Some of Ortmann's notable coworkers include Yong Liang and John Eugene Berg. Their collaborative efforts contribute to the innovative environment at PsiQuantum Corp., fostering advancements in quantum technologies.
Conclusion
John Elliott Ortmann, Jr. is a distinguished inventor whose work in molecular beam epitaxy has the potential to revolutionize film fabrication techniques. His contributions to the field are significant and continue to influence advancements in technology.