CH

John Edwin Shulze

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Edwin Shulze. Retrieved from https://idiyas.com/inventor/john-edwin-shulze-ll2fo1fr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Title: John Edwin Shulze: Innovator in Medical Technology

Introduction

John Edwin Shulze is a notable inventor based in Switzerland. He has made significant contributions to the field of medical technology, particularly in the development of advanced catheter systems. His innovative work focuses on enhancing the efficacy of drug delivery systems through specialized coatings.

Latest Patents

John Edwin Shulze holds a patent for a "Coating For Intraluminal Expandable Catheter Providing Contact Transfer Of Drug Micro-Reservoirs." This invention involves a coating for an expandable portion of a catheter that comprises a hydrophobic matrix and a dispersed phase. The dispersed phase contains a plurality of micro-reservoirs, which include a first active agent and a biodegradable or bioerodable polymer. The patent also outlines a coating formulation and a method for forming the coating, as well as a catheter that incorporates this innovative coating.

Career Highlights

Throughout his career, John Edwin Shulze has been dedicated to advancing medical technologies. His work has focused on improving patient outcomes through innovative drug delivery methods. He is associated with M.A. Med Alliance SA, where he continues to contribute to the field.

Collaborations

John has collaborated with several professionals in his field, including Robert John Elicker and Michael Thomas Ahlering. These collaborations have further enhanced the development of his innovative technologies.

Conclusion

John Edwin Shulze is a prominent figure in the medical technology sector, known for his innovative approaches to catheter design and drug delivery systems. His contributions continue to impact the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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