Stormville, NY, United States of America

John Edward Dean


Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 93(Granted Patents)


Location History:

  • Putnam Valley, NY (US) (1999)
  • Stornville, NY (US) (2012)
  • Stormville, NY (US) (2002 - 2022)

Company Filing History:


Years Active: 1999-2022

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Innovations and Contributions of John Edward Dean

Introduction

John Edward Dean is a notable inventor based in Stormville, NY (US), recognized for his significant contributions to technology through his innovative patents. With a total of 12 patents to his name, Dean has made strides in various fields, particularly in imaging and communication technologies.

Latest Patents

Among his latest patents, Dean has developed systems, methods, and apparatuses for image artifact cancellation. This innovation focuses on reducing or eliminating reverberation artifacts in images, utilizing ultrasound probes to enhance image quality. Additionally, he has created a method and apparatus for high-speed LVDS communication. This system allows for the transmission of payload data over multiple low voltage differential signaling channels, ensuring efficient and synchronized communication between devices.

Career Highlights

Throughout his career, John Edward Dean has worked with prominent companies such as Koninklijke Philips Corporation N.V. and Philips Electronics North America Corporation. His experience in these organizations has contributed to his expertise and the development of his innovative technologies.

Collaborations

Dean has collaborated with notable individuals in the field, including Peter J. Janssen and Lucian Remus Albu. These partnerships have likely fostered an environment of creativity and innovation, leading to the successful development of his patents.

Conclusion

John Edward Dean's contributions to technology through his patents reflect his dedication to innovation and improvement in imaging and communication systems. His work continues to influence the industry and inspire future advancements.

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