Company Filing History:
Years Active: 1991-2001
Title: The Innovative Contributions of John E Walls
Introduction
John E Walls is a notable inventor based in Fort Collins, CO (US). He has made significant contributions to the field of imaging technology, holding a total of 15 patents. His work has advanced the development of positive-working imaging compositions and elements, showcasing his expertise in the area.
Latest Patents
Among his latest patents is a positive-working imaging composition and element that utilizes a method of forming a positive image with a laser. This innovative element is sensitive to infrared radiation and comprises an imaging layer containing an alkali-soluble reactive resin, an infrared radiation absorbing compound, a thermochemical acid generating compound, and a dissolution inhibitor with acid-cleavable C—O—C groups. Upon exposure to laser light, a Bronsted acid is generated, breaking the bonds of the C—O—C groups and allowing the exposed regions of the reactive resin to be solubilized in an alkaline developer solution. Another significant patent involves photosensitive compositions and elements that incorporate dyed photosensitive polyesters. These polyesters contain unsaturated photosensitive moieties and dye moieties derived from copolymerizable diols, enabling the preparation of negative-working photosensitive elements, such as printing plates.
Career Highlights
John E Walls has had a distinguished career, working with prominent companies such as Eastman Kodak Company and Kodak Polychrome Graphics, GmbH. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in imaging technology.
Collaborations
Throughout his career, John has collaborated with notable individuals, including Paul R West and Gary R Miller. These partnerships have further enriched his work and led to the development of advanced imaging solutions.
Conclusion
John E Walls is a remarkable inventor whose contributions to imaging technology have had a lasting impact. His innovative patents and collaborations reflect his dedication to advancing the field.
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