Mahwah, NJ, United States of America

John E Van Dine

This inventor holds 6 USPTO granted patents. Top assignee: Sun Active Glass Electrochromics, Inc.. Active years: 1994-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John E Van Dine. Retrieved from https://idiyas.com/inventor/john-e-van-dine-iyf8ghuk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 433(Granted Patents)


Company Filing History:


Years Active: 1994-1998

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6 patents (USPTO):Explore Patents

Title: Innovations of John E Van Dine

Introduction

John E Van Dine is a notable inventor based in Mahwah, NJ (US). He has made significant contributions to the field of electrochromic devices, holding a total of 6 patents. His work focuses on enhancing the functionality and efficiency of these devices for large surface area applications.

Latest Patents

One of his latest patents involves electrochromic devices and methods that utilize optical tuning. This innovation minimizes optical interference between layers of the structure while maximizing uniform optical transparency. The optical tuning also allows for the replacement of transparent conductive oxide layers with thin conductive metal layers. This advancement reduces the overall thickness of the devices and facilitates the manufacturing process.

Career Highlights

John E Van Dine is currently associated with Sun Active Glass Electrochromics, Inc. His work has been pivotal in advancing the technology behind electrochromic devices, making them more efficient and easier to produce.

Collaborations

He has collaborated with notable coworkers such as V D Parkhe and Forrest A Trumbore, contributing to the development of innovative solutions in the field.

Conclusion

John E Van Dine's contributions to electrochromic devices exemplify the impact of innovation in technology. His patents reflect a commitment to improving manufacturing processes and device efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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