Poway, CA, United States of America

John E Rauch


Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 131(Granted Patents)


Company Filing History:


Years Active: 2003

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2 patents (USPTO):Explore Patents

Title: John E. Rauch: Innovator in High Energy Photon Sources

Introduction

John E. Rauch is a notable inventor based in Poway, California, recognized for his contributions to the field of high energy photon sources. With a total of 2 patents, he has made significant advancements in plasma technology, particularly in the development of innovative light sources.

Latest Patents

Rauch's latest patents include the "Plasma focus light source with active and buffer gas control" and the "Plasma focus light source with tandem ellipsoidal mirror units." Both inventions focus on creating high energy photon sources using plasma pinch electrodes located in a vacuum chamber. These patents describe a system that utilizes a pulse power source to generate electrical discharges, producing high temperature and high density plasma pinches. The technology is designed to achieve specific spectral lines by controlling the concentration of active gases within the chamber.

Career Highlights

John E. Rauch is currently employed at Cymer, Inc., where he continues to innovate in the field of photonics. His work has contributed to advancements in the efficiency and effectiveness of photon sources, which have applications in various industries, including semiconductor manufacturing.

Collaborations

Rauch has collaborated with notable colleagues such as Stephan T. Melnychuk and William N. Partlo, further enhancing the research and development efforts at Cymer, Inc.

Conclusion

John E. Rauch's contributions to high energy photon sources exemplify the innovative spirit of modern inventors. His patents reflect a commitment to advancing technology in the field of plasma physics, making significant impacts on various applications.

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