This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: The Innovations of John E. Darney
Introduction
John E. Darney is an accomplished inventor based in Pine Bush, NY (US). He has made significant contributions to the field of materials analysis, particularly through his innovative patent. His work focuses on the real-time analysis of output volatiles upon UV exposure, which has important applications in various industries.
Latest Patents
John E. Darney holds a patent for an "Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis." This invention allows for real-time analysis of output volatiles using a laboratory-scale apparatus. The methods and apparatus utilize external or internal radiation sources, especially broad band external UV radiation. This technology is particularly useful in the analysis and screening of photoresist materials. The apparatus preferably employs FTIR or MS analysis, enhancing its effectiveness in material evaluation.
Career Highlights
Darney is currently associated with International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to leverage his expertise in materials science and contribute to cutting-edge research and development projects. His innovative approach has positioned him as a valuable asset within the company.
Collaborations
Throughout his career, John E. Darney has collaborated with notable colleagues, including Mark S. Chace and David Robert Medeiros. These collaborations have fostered a productive environment for innovation and have led to advancements in their respective fields.
Conclusion
John E. Darney's contributions to the field of materials analysis through his patent and work at IBM highlight his role as a significant inventor. His innovative apparatus for analyzing volatiles upon UV exposure showcases the importance of his work in advancing technology.