Avondale, PA, United States of America

John D Vansant

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John D Vansant. Retrieved from https://idiyas.com/inventor/john-d-vansant

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: John D. Vansant: Innovator in Protective Liner Technology

Introduction

John D. Vansant is a notable inventor based in Avondale, Pennsylvania. He has made significant contributions to the field of protective materials, particularly through his innovative patent for a multilayer protective liner. His work is instrumental in developing highly abrasion-resistant protective liners, which are essential in various industrial applications.

Latest Patents

Vansant holds one patent for a multilayer structure that is useful for preparing highly abrasion-resistant protective liners. This invention includes tubular articles such as multilayer tubes or pipes, showcasing his commitment to enhancing material durability and performance.

Career Highlights

John D. Vansant is associated with E.I. du Pont de Nemours and Company, a leading organization in the field of materials science. His role at the company has allowed him to leverage his expertise in developing innovative solutions that meet industry demands.

Collaborations

Throughout his career, Vansant has collaborated with talented individuals such as Benjamin Andrew Smillie and Sassan Hojabr. These partnerships have contributed to the advancement of technology in protective materials.

Conclusion

John D. Vansant's contributions to the field of protective liners exemplify the impact of innovation in material science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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