Clay, NY, United States of America

John D Neidig

This inventor holds 1 USPTO granted patent. Top assignee: Allied Corporation. Active years: 1986.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 1986

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of John D Neidig

Introduction

John D Neidig is a notable inventor based in Clay, NY (US). He has made significant contributions to the field of technology through his innovative patent. His work focuses on methods that enhance the efficiency of conductive materials in various applications.

Latest Patents

John D Neidig holds a patent for a "Method for placing electrically conductive paths on a substrate." This process involves applying a layer of metal powder to a heat-softenable substrate. The method includes compacting the powder in a predetermined pattern using a heated die under pressure. The compacted powder is then embedded by continuing the application of the die at a pressure less than the initial compacting pressure. This innovative approach has the potential to improve manufacturing processes in electronics and other industries.

Career Highlights

Throughout his career, John has been associated with Allied Corporation, where he has utilized his expertise to develop cutting-edge technologies. His work has not only contributed to the company's success but has also advanced the field of conductive materials.

Collaborations

John D Neidig has collaborated with notable colleagues, including Edwin D Lillie and Robert P Kane. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.

Conclusion

John D Neidig's contributions to the field of invention, particularly in the area of conductive materials, highlight his role as a significant innovator. His patent and collaborations reflect a commitment to advancing technology and improving manufacturing processes.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…