This inventor holds 1 USPTO granted patent. Top assignee: Air Products and Chemicals, Inc.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: John D Loftin: Innovator in Chemical Vapor Deposition
Introduction
John D Loftin is a notable inventor based in Escondido, CA (US). He has made significant contributions to the field of chemical vapor deposition, particularly in the development of oxynitride films for electronic applications. His innovative work has led to the granting of a patent that showcases his expertise and dedication to advancing technology.
Latest Patents
John D Loftin holds a patent for a process of chemical vapor deposition (CVD) of hafnium (Hf) and zirconium (Zr) containing oxynitride films. This invention is crucial for creating films suitable for use as gate dielectrics in electronic devices. The patented process involves delivering a Zr or Hf containing precursor in gaseous form to a CVD chamber, while simultaneously introducing an oxygen source and a nitrogen source separately. This method ensures that the mixing of these sources occurs only within the chamber, allowing for effective deposition of the desired films on a heated substrate. Additionally, a silicon containing precursor may be added to form Zr or Hf silicon oxynitride films.
Career Highlights
John D Loftin is associated with Air Products and Chemicals, Inc., where he continues to apply his expertise in chemical vapor deposition. His work has been instrumental in enhancing the capabilities of electronic materials, contributing to advancements in the industry. With a patent portfolio that includes 1 patent, Loftin's innovations are recognized for their impact on technology.
Collaborations
Some of his notable coworkers include Robert Daniel Clark and Arthur Kenneth Hochberg. Their collaborative efforts have likely contributed to the success of Loftin's projects and innovations.
Conclusion
John D Loftin is a distinguished inventor whose work in chemical vapor deposition has paved the way for advancements in electronic applications. His patented process for forming oxynitride films demonstrates his commitment to innovation and excellence in the field.