John C Shen

Title: Innovations of John C Shen

Introduction

John C Shen is a notable inventor based in Rochester, MN (US). He has made significant contributions to the field of polishing processes, holding a total of 10 patents. His work focuses on enhancing the smoothness of disk substrate surfaces, which is crucial in various technological applications.

Latest Patents

One of his latest patents is the "Substrate independent superpolishing process and slurry." This invention utilizes a combination of chemical and mechanical finishing processes to polish a disk substrate surface to near atomic smoothness. The process begins with a disk substrate that has been machined to a predetermined surface roughness. The surface is then subjected to a chemical formulation, known as an attacking agent, which softens the substrate material. Following this, the softened material is mechanically wiped away, resulting in a highly polished surface.

Career Highlights

Throughout his career, John C Shen has worked with prominent companies, including the International Business Machines Corporation (IBM). His expertise in polishing processes has made him a valuable asset in the field of material science and engineering.

Collaborations

John C Shen has collaborated with several professionals in his field, including John C Ottman and Brent Ray Den Hartog. These collaborations have contributed to the advancement of polishing technologies and innovations.

Conclusion

John C Shen's contributions to the field of polishing processes are noteworthy, with his innovative patents paving the way for advancements in disk substrate technology. His work continues to influence the industry and inspire future innovations.