The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Nov. 05, 1997
Applicant:
Inventors:
Brent Ray Den Hartog, Rochester, MN (US);
Dennis Leonard Fox, Rochester, MN (US);
James Aloysius Hagan, Rochester, MN (US);
John Chen Shen, Rochester, MN (US);
Kannimangalam Venkatasubramanyam Viswanathan, West Boro, MA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/82 ;
U.S. Cl.
CPC ...
G11B 5/82 ;
Abstract
The present invention utilizes a combination of chemical and mechanical finishing processes to polish a disk substrate surface to near atomic smoothness. Broadly speaking, the surface of a disk substrate that has been machined (i.e., rough ground) to a predetermined surface roughness is subjected to attack by a chemical formulation (called an attacking agent). The chemical formulation is used to soften the substrate material. Then, the softened material is “wiped away” via mechanical action.