Vienna, VA, United States of America

John C Egermeier


Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 61(Granted Patents)


Company Filing History:


Years Active: 1990-1992

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3 patents (USPTO):Explore Patents

Title: Innovator John C. Egermeier: Pioneering Developments in Chemical Vapor Deposition

Introduction

John C. Egermeier, based in Vienna, VA, is a prominent inventor known for his significant contributions to the field of chemical vapor deposition and advanced lighting technologies. With a portfolio of three patents, he has made remarkable strides in developing innovative solutions that enhance precision and efficiency in industrial processes.

Latest Patents

Among his latest inventions is a patent for a **Surface Discharge Radiation Source**. This excimer light source features a one-sided cell design, allowing all electrodes and the dielectric to be positioned on one side of the discharge space. This unique construction ensures that the light produced is free from shadowing and attenuation caused by electrodes, while also allowing for closely controlled electrode temperatures. The design simplifies the manufacturing process by removing the need for maintaining parallelism and close tolerances in the discharge space.

Another notable patent is the **Reaction Chamber Having Non-Clouded Window**. This innovative reaction chamber is designed for chemical vapor deposition processes, specifically focusing on preventing clouding of the window through which light passes. The chamber boasts a baffle system that divides it into distinct reactant, buffer, and window zones, ensuring that the momentum flux densities of gases remain well-matched. Furthermore, it incorporates discontinuities in the reactor walls to curb the diffusion of reactant gases toward the window, enhancing the overall efficiency of the process.

Career Highlights

John C. Egermeier is currently affiliated with Fusion Systems Corporation, where he applies his expertise to drive forward the company's innovations in advanced technology. His work is characterized by a commitment to developing practical solutions that address challenges in the industry.

Collaborations

Throughout his career, Egermeier has collaborated with talented professionals, including his coworkers Janet Ellzey and Delroy O. Walker. These partnerships have enabled him to combine various skills and insights to further his inventive pursuits and contribute to the company's success.

Conclusion

John C. Egermeier stands out as a visionary inventor in his field, with a track record of developing innovative technologies that blend efficiency and functionality. His contributions, particularly in the areas of chemical vapor deposition and surface discharge light sources, highlight his role as a key player in advancing industrial processes.

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