Company Filing History:
Years Active: 1991-1996
Title: John B Straight: Innovator in Isolation Structures
Introduction
John B Straight is an inventor known for his contributions to the field of semiconductor technology. He has developed innovative methods for forming variable width isolation structures, which are crucial in the fabrication of integrated circuits. His work focuses on enhancing the performance and reliability of electronic devices.
Latest Patents
John B Straight holds a patent for a method titled "Method For Forming Variable Width Isolation Structures." This patent describes an isolation structure and a method for using and fabricating it in an active layer deposited on a substrate. The fabrication process includes several steps: forming a buried oxide layer in the active layer adjacent to the substrate, etching an isolation trench in the active layer, applying a dielectric isolation layer on the trench surfaces, removing the dielectric layer from the trench bottom, and epitaxially growing monocrystalline silicon in the trench to create the isolation structure.
Career Highlights
Throughout his career, John B Straight has worked in various capacities within the semiconductor industry. His expertise in isolation structures has made significant contributions to the advancement of semiconductor technology. Despite having no patents attributed to him, his innovative methods have influenced the design and manufacturing processes in the field.
Collaborations
John has collaborated with notable professionals in the industry, including Michael S Liu and Curtis H Rahn. These collaborations have allowed him to share knowledge and expertise, further enhancing the development of isolation structures.
Conclusion
John B Straight is a notable figure in the field of semiconductor technology, recognized for his innovative methods in forming isolation structures. His contributions have played a vital role in advancing the capabilities of electronic devices.