Hazlet, NJ, United States of America

John Anton Parkinson



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: John Anton Parkinson: Innovator in Refractory Material Gunning Technology

Introduction

John Anton Parkinson is a notable inventor based in Hazlet, NJ (US). He has made significant contributions to the field of material application technology, particularly in the gunning of refractory materials. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of material spraying processes.

Latest Patents

John Anton Parkinson holds a patent for an "Apparatus for the gunning of a refractory material and nozzles for same." This apparatus features a nozzle with an inner passage designed for the introduction of wetted material, along with an outer passage that allows gas to be passed through and impinged on the wetted material. The design includes a material delivery hose and a water inlet to ensure optimal wetting of the material before it is sprayed. This invention represents a significant advancement in the application of refractory materials.

Career Highlights

Throughout his career, John has worked with reputable companies, including Specialty Minerals Inc. and Specialty Minerals (Michigan) Inc. His experience in these organizations has contributed to his expertise in material application technologies.

Collaborations

John has collaborated with notable individuals in his field, including Bernard D. Gist and Erwin Anton Letzgus, Jr. These collaborations have likely enriched his work and contributed to the development of innovative solutions in material gunning technology.

Conclusion

John Anton Parkinson's contributions to the field of refractory material application are noteworthy. His patented apparatus showcases his innovative spirit and dedication to improving material application processes. His work continues to influence the industry and inspire future advancements.

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