Surrey, United Kingdom

John Andrew Rouse


Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • London, GB (2002)
  • Surrey, GB (2002 - 2003)

Company Filing History:


Years Active: 2002-2003

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4 patents (USPTO):

Title: John Andrew Rouse: Innovator in Electron Beam Lithography

Introduction

John Andrew Rouse is a notable inventor based in Surrey, GB. He has made significant contributions to the field of electron beam lithography, holding a total of 4 patents. His work focuses on improving the precision and effectiveness of electron patterning tools.

Latest Patents

Rouse's latest patents include innovative apparatuses and methods for electron beam lithography. One of his patents, titled "Electron beam lithography apparatus focused through spherical aberration introduction," describes an apparatus that includes a source for producing an electron beam, a mask, and a projection column. This design allows the electron beam to be focused on a wafer, effectively reducing the negative defocusing effects caused by chromatic aberrations. This technology is applicable to various electron patterning tools, including the SCALPEL™ electron patterning tool.

Another patent, "Electron beam lithography focusing through spherical aberration introduction," shares similar features and applications, emphasizing the importance of spherical aberrations in enhancing the performance of electron patterning tools.

Career Highlights

Throughout his career, Rouse has worked with prominent companies such as Agere Systems Inc. and Agere Systems Guardian Corporation. His experience in these organizations has contributed to his expertise in electron beam technology and lithography.

Collaborations

Rouse has collaborated with notable professionals in his field, including Eric Munro and Victor Katsap. These partnerships have likely enriched his work and led to advancements in electron beam lithography.

Conclusion

John Andrew Rouse is a distinguished inventor whose work in electron beam lithography has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to improving technology in this area.

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