John A Romberger

Title: The Innovative Contributions of John A. Romberger

Introduction

John A. Romberger is a notable inventor based in Oak Park, Illinois, with a remarkable portfolio of eight patents. His work primarily focuses on advancements in chemical formulations, particularly in the field of polishing slurries and polymer dispersants.

Latest Patents

Among his latest innovations is a low sodium, low metals silica polishing slurry. This colloidal silica slurry features a low metals ammonium-stabilized silica sol with specific characteristics, including SiO₂ content ranging from 15 to 50 weight percent, a pH between 8.5 and 11.3, and a particle diameter from 4.0 to 130 nm. The formulation also includes minimal amounts of aluminum, iron, potassium, and sodium, along with a bactericide and a polishing rate accelerator. Additionally, he has developed an aqueous slurry comprising synthetic fibers and a water-soluble acrylamide polymer dispersant, which contains a significant percentage of 2-acrylamido-2-methylpropanesulfonic acid units.

Career Highlights

Romberger has made significant contributions during his career, particularly while working at Nalco Chemical Company. His expertise in chemical formulations has led to innovative solutions that address industry needs.

Collaborations

Throughout his career, Romberger has collaborated with notable individuals such as Charles C. Payne and Fred B. Breakey, enhancing the impact of his inventions through teamwork and shared expertise.

Conclusion

John A. Romberger's contributions to the field of chemical formulations and polishing slurries demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving product performance and addressing industry challenges.