Clifton Park, NY, United States of America

John A Palm


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Clifton Park, NY (US) (1981)
  • Jonesville, NY (US) (1983)

Company Filing History:


Years Active: 1981-1983

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2 patents (USPTO):Explore Patents

Title: Innovations of John A. Palm

Introduction

John A. Palm is a notable inventor based in Clifton Park, NY (US). He has made significant contributions to the field of materials science, particularly in the development of silicon nitride technologies. With a total of 2 patents, his work has advanced the understanding and application of this important material.

Latest Patents

One of his latest patents is focused on the "Sintering of silicon nitride to high density." This innovation involves producing a silicon nitride compact with a density of 95% to 100% by forming a particulate dispersion of silicon nitride and a beryllium additive. The process includes sintering the compact at temperatures ranging from about 1900°C to about 2200°C in nitrogen at superatmospheric pressure. This method prevents thermal decomposition of the silicon nitride until the compact's surface becomes impermeable to nitrogen gas. The second sintering step occurs at a nitrogen pressure at least twice that of the first.

Another significant patent is for "Light-transmitting silicon nitride." This invention describes a polycrystalline silicon nitride body with a density of at least 99.5% of the theoretical density of silicon nitride. The body has a thickness ranging from about 0.15 mm to less than 0.4 mm, with specific transmission characteristics for radiant energy at various wavelengths.

Career Highlights

John A. Palm is associated with General Electric Company, where he has applied his expertise in materials science. His work has contributed to advancements in high-performance materials used in various applications.

Collaborations

Throughout his career, John has collaborated with notable colleagues, including Charles D. Greskovich and Svante Prochazka. These collaborations have further enriched his research and innovations in the field.

Conclusion

John A. Palm's contributions to the field of silicon nitride technology demonstrate his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to enhancing the performance and applications of silicon nitride, making a lasting impact in the industry.

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