Graz, Austria

Johannes Raber

This inventor holds 1 USPTO granted patent. Top assignee: Max-Planck-Gesellschaft Zur Förderung Der Wissenschaften E. V. . Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Innovations of Johannes Raber in Electropositive Metal Deposition

Introduction

Johannes Raber is an accomplished inventor based in Graz, Austria. He has made significant contributions to the field of electropositive metal deposition. His innovative approach has led to the development of a unique process that enhances the efficiency of metal layer applications.

Latest Patents

Johannes Raber holds a patent for a "Process for the currentless deposition of electropositive metal layers." This invention provides a method for depositing electropositive metal layers onto less electropositive metals without the need for electrical current. The process involves using a coating bath that contains a metal complex formed by reacting a monovalent electropositive metal halide with a base capable of complex formation, along with a hydrohalic acid. This innovative method not only simplifies the deposition process but also improves the quality of the metal layers applied.

Career Highlights

Johannes Raber is associated with the Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., a prestigious research organization. His work has been instrumental in advancing the understanding and application of electropositive metals in various industries. With a focus on practical applications, Raber's contributions have the potential to impact multiple sectors, including electronics and materials science.

Collaborations

Johannes Raber has collaborated with notable colleagues such as Helmut Quast and Karl Peters. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Johannes Raber's work in the field of electropositive metal deposition represents a significant advancement in materials science. His patented process offers a novel approach to metal layer applications, showcasing his commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
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