Johannes Henricus Maria Linders

Title: Innovator Spotlight: Johannes Henricus Maria Linders

Introduction:

Johannes Henricus Maria Linders is a visionary inventor in the field of lithographic apparatus and device manufacturing techniques. Hailing from Veldhoven, Netherlands, Linders has made a significant impact with his groundbreaking inventions.

Latest Patents:

Linders has obtained a notable patent for his innovation titled "Lithographic apparatus and device manufacturing method." This patent introduces improved complementary phase shift mask (c:PSM) imaging techniques, focusing on enhancing CD uniformity in the double exposure process. By implementing scattering bars on the trim mask, Linders has revolutionized the optimization of isofocal CD and sensitivity levels in the c:PSM process.

Career Highlights:

Currently employed at ASML Netherlands B.V., Linders has leveraged his expertise to push the boundaries of technology in the manufacturing sector. His dedication to innovation and problem-solving has cemented his reputation as a leading figure in the industry.

Collaborations:

Throughout his career, Linders has collaborated closely with esteemed professionals, including his coworker Koen Van Ingen Schenau. Together, they have synergized their talents to drive forward cutting-edge research and development initiatives.

Conclusion:

Johannes Henricus Maria Linders stands as a beacon of innovation, consistently pushing the envelope of technological advancement in lithographic apparatus and device manufacturing. His contributions continue to shape the industry and inspire future generations of inventors.