Johannes Grandia

Title: Innovations of Johannes Grandia

Introduction

Johannes Grandia is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of technology, particularly in the areas of liquid phase epitaxial growth and electroplating. With a total of 3 patents to his name, Grandia's work has had a substantial impact on the industry.

Latest Patents

One of Grandia's latest patents is a "Holder for liquid phase epitaxial growth." This innovative holder eliminates mesas on the surface of the film, featuring two legs connected by a ring that can hold one or two wafers back-to-back. The design prevents film formation from the liquid melt when withdrawn from the growth solution, thus eliminating the formation of mesas.

Another significant patent is the "Rotary electroplating cell with controlled current distribution." This apparatus allows for the rotary electroplating of a thin metallic film with uniform thickness and composition. It includes a flow-through jet plate with nozzles that provide a differential flow distribution of the plating solution. The method ensures that the electrical currents are controlled to maintain a constant current throughout the plating process, allowing for precise deposition.

Career Highlights

Johannes Grandia is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to explore and develop innovative technologies that enhance manufacturing processes.

Collaborations

Throughout his career, Grandia has collaborated with notable coworkers such as Hugo Alberto Santini and Daniel Francis O'Kane. These collaborations have contributed to the advancement of his inventions and the overall success of his projects.

Conclusion

Johannes Grandia's contributions to the field of technology through his patents and work at IBM highlight his innovative spirit and dedication to advancing manufacturing processes. His inventions continue to influence the industry and pave the way for future advancements.