This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Giesecke & Devrient Gmbh. Active years: 2016.
Company Filing History:
Years Active: 2016
Title: Innovations of Johannes Beier in Substrate Manufacturing
Introduction
Johannes Beier is a notable inventor based in Warngau, Germany. He has made significant contributions to the field of substrate manufacturing, particularly through his innovative methods that enhance security features in products.
Latest Patents
Johannes Beier holds 1 patent for a method and device for manufacturing a sheet-like substrate. This patent describes a process that involves inserting a security thread into the substrate, ensuring that it is at least partially embedded. The security thread features distinct elements that are spaced apart in the longitudinal direction. After embedding, at least one feature is displayed as an image, and the stretch of the embedded security thread is calculated based on this image. The method also includes obliterating regions of the substrate where the calculated stretch exceeds a specified maximum stretch.
Career Highlights
Johannes Beier is associated with Giesecke & Devrient GmbH, a company known for its expertise in security technologies. His work at this organization has allowed him to focus on developing advanced methods for enhancing the security of various substrates.
Collaborations
Johannes has collaborated with notable colleagues such as Andreas Pretsch and Bernhard Wiedner. Their combined efforts contribute to the innovative projects at Giesecke & Devrient GmbH.
Conclusion
Johannes Beier's contributions to substrate manufacturing reflect his commitment to innovation and security. His patent showcases a unique approach to embedding security features, which is crucial in today's technology-driven world.