Seattle, WA, United States of America

Johanna Schwartz

This inventor holds 1 USPTO granted patent. Top assignee: University of Washington. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johanna Schwartz. Retrieved from https://idiyas.com/inventor/johanna-schwartz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Johanna Schwartz: Innovator in Additive Manufacturing

Introduction

Johanna Schwartz is a prominent inventor based in Seattle, WA (US). She has made significant contributions to the field of additive manufacturing, particularly through her innovative approaches to vat photopolymerization.

Latest Patents

Johanna holds 1 patent for her work titled "Vat photopolymerization additive manufacturing of multi-material parts." This patent outlines a method for creating articles by utilizing a composition that includes two or more types of polymerizable monomers and polymerization initiators. The process involves exposing a build region to polymerization stimuli, polymerizing the monomers to form a polymer layer, and advancing this layer to produce a three-dimensional article with integrally mixed polymers.

Career Highlights

Johanna Schwartz is affiliated with the University of Washington, where she continues to advance her research in additive manufacturing. Her work has garnered attention for its potential applications in various industries, including aerospace and medical devices.

Collaborations

Johanna has collaborated with notable colleagues such as Andrew Jackson Boydston and Carl Thrasher, contributing to a dynamic research environment that fosters innovation.

Conclusion

Johanna Schwartz exemplifies the spirit of innovation in the field of additive manufacturing. Her contributions are paving the way for new advancements in technology and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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