Altomünster, Germany

Johann Oettl

This inventor holds 1 USPTO granted patent. Top assignee: Mtu Aero Engines Gmbh. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johann Oettl. Retrieved from https://idiyas.com/inventor/johann-oettl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Johann Oettl: Innovator in Surface Treatment Technology

Introduction

Johann Oettl is a notable inventor based in Altomuenster, Germany. He has made significant contributions to the field of surface treatment technology. His innovative approach has led to the development of a unique method for removing layers from various surfaces.

Latest Patents

Oettl holds a patent for a "Method and device for removing a layer from a surface of a body." This invention discloses a method for removing a layer made of a first material from a surface of a body made of a second material. The process involves subjecting the body to a pressurized jet containing a blasting medium composed of particles. The pressurized jet is designed to have an Almen intensity of at most 0.35 Almen A, with preferred intensities of at most 0.3 Almen A and particularly at most 0.25 Almen A.

Career Highlights

Johann Oettl is associated with Mtu Aero Engines GmbH, where he applies his expertise in engineering and innovation. His work focuses on enhancing surface treatment processes, which are crucial in various industrial applications.

Collaborations

Oettl has collaborated with notable colleagues such as Horst Pillhoefer and Markus Niedermeier. Their combined efforts contribute to advancements in technology and innovation within their field.

Conclusion

Johann Oettl's contributions to surface treatment technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to improving industrial processes, showcasing the importance of invention in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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