Gross St. Florian, Austria

Johann Ninaus

This inventor holds 1 USPTO granted patent. Top assignee: Austriamicrosystems Ag. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johann Ninaus. Retrieved from https://idiyas.com/inventor/johann-ninaus

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Johann Ninaus: Innovator in Silicon Nitride Etching Technology

Introduction

Johann Ninaus is a notable inventor based in Gross St. Florian, Austria. He has made significant contributions to the field of etching technology, particularly in the etching of silicon nitride. His innovative approach has led to the development of a patented apparatus that enhances the etching process.

Latest Patents

Johann Ninaus holds a patent for an "Etch apparatus and method of etching silicon nitride." This apparatus includes a control unit that is coupled to various components such as heater current sensors, a pump transducer sensor, and a flow sensor for a diluting liquid. The design aims to prevent malfunctions and allows for better control of the etching process, ultimately improving performance.

Career Highlights

Ninaus is associated with Austriamicrosystems AG, a company known for its advancements in microelectronics. His work at the company has been instrumental in pushing the boundaries of etching technology. With a focus on innovation, he has contributed to the development of solutions that meet the demands of modern semiconductor manufacturing.

Collaborations

Johann Ninaus collaborates with Gerhard Eilmsteiner, a fellow innovator in the field. Their partnership exemplifies the spirit of teamwork in driving technological advancements.

Conclusion

Johann Ninaus is a key figure in the realm of silicon nitride etching technology. His patented innovations and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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