Johan W Nelissen

Title: Johan W Nelissen: Innovator in Metal Layer Technology

Introduction

Johan W Nelissen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of materials science, particularly in the development of methods for providing metal layers on substrates. With a total of 2 patents, his work has implications for various applications in technology and manufacturing.

Latest Patents

Nelissen's latest patents include a method of providing a metal layer on a substrate with an ultra-smooth or microprofiled surface. This innovative method involves reproducing the surface structure in the metal layer. The process utilizes a hydrophilic substrate surface, treated with a bonding intermediary, followed by vapor deposition of the metal layer. His second patent focuses on manufacturing articles of synthetic resin with an electroless metal layer. This method involves polymerizing a mixture of monomeric acrylates and an N-substituted pyrrolidon compound, followed by treatment with aromatic carboxylic acids and electroless deposition of the metal layer.

Career Highlights

Johan W Nelissen is currently associated with U.S. Philips Corporation, where he continues to advance his research and development efforts. His work has been instrumental in enhancing the capabilities of metal layer applications in various industries.

Collaborations

Throughout his career, Nelissen has collaborated with esteemed colleagues, including Johannes J Ponjee and Christiaan J Verwijlen. These collaborations have fostered innovation and contributed to the success of his projects.

Conclusion

Johan W Nelissen's contributions to the field of metal layer technology exemplify his dedication to innovation and excellence. His patents reflect a deep understanding of materials science and its applications in modern technology.