Waalre, Netherlands

Johan Roelof Wiersema

This inventor holds 1 USPTO granted patent. Top assignee: Vistaprint Schweiz Gmbh. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johan Roelof Wiersema. Retrieved from https://idiyas.com/inventor/johan-roelof-wiersema

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Johan Roelof Wiersema

Introduction

Johan Roelof Wiersema is a notable inventor based in Waalre, Netherlands. He has made significant contributions to the field of printing technology, particularly with his innovative approach to ink consumption.

Latest Patents

Wiersema holds a patent for "Adaptive take-off strips for smoothing ink consumption." This invention involves the adaptive generation of take-off strips based on the color profile of the image being printed. The goal is to smooth ink consumption and ensure a more consistent ink coverage and flow. The adaptive take-off strips are designed to have complementary color profiles to the image being printed, enhancing the overall quality of printed materials.

Career Highlights

Wiersema is currently employed at Vistaprint Schweiz GmbH, where he continues to develop and refine his innovative ideas. His work at Vistaprint has allowed him to explore new technologies and improve printing processes.

Collaborations

Throughout his career, Wiersema has collaborated with talented individuals such as Guido Keller and Anna Maria Ayuso. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Johan Roelof Wiersema is a pioneering inventor whose work in adaptive take-off strips has the potential to revolutionize the printing industry. His dedication to innovation and collaboration continues to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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