Joel M Cook

Title: The Innovations of Joel M Cook

Introduction

Joel M Cook is a notable inventor based in Union Township, NJ (US). He holds 2 patents that showcase his contributions to the field of semiconductor technology. His work has significantly impacted the efficiency and effectiveness of etching processes used in the industry.

Latest Patents

One of his latest patents is focused on a downstream apparatus and technique. This innovation allows for the rapid and economical treatment of multiple semiconductor substrates. The configuration of the downstream etching apparatus helps avoid global and localized loading effects. The design features a discharge region that is relatively large compared to the volume occupied by the substrates. Additionally, the concentration of the etchant species in the effluent is maintained at a level comparable to that produced in the discharge region. Another significant patent involves etching techniques that achieve a highly selective etch for silicon, tantalum, tantalum silicide, and tantalum nitride. This selectivity, greater than 100 to 1, is accomplished using polyatomic halogen fluorides without the need for plasmas or wet etching.

Career Highlights

Throughout his career, Joel M Cook has worked with prestigious organizations such as AT&T Bell Laboratories and AT&T Technologies, Inc. His experience in these companies has allowed him to develop and refine his innovative techniques in semiconductor processing.

Collaborations

Joel has collaborated with notable individuals in his field, including Daniel L Flamm and Vincent Michael Donnelly, Jr. These partnerships have contributed to the advancement of his research and inventions.

Conclusion

Joel M Cook's contributions to semiconductor technology through his patents and career achievements highlight his role as an influential inventor. His innovative approaches continue to shape the industry and inspire future advancements.