Livonia, MI, United States of America

Joe Holubka

This inventor holds 1 USPTO granted patent. Top assignee: Ford Global Technolgoies, LLC. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joe Holubka. Retrieved from https://idiyas.com/inventor/joe-holubka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Joe Holubka: Innovator in Glass Substrate Bonding

Introduction

Joe Holubka is an accomplished inventor based in Livonia, MI (US). He has made significant contributions to the field of bonding technologies, particularly through his innovative methods for treating glass substrates.

Latest Patents

Holubka holds a patent for a "Method of treating substrates for bonding." This method involves treating a glass substrate that has both fritted and non-fritted portions. The fritted portion includes a bondable surface, which is cleaned and activated for bonding through the application of air plasma. This innovative approach enhances the bonding process, making it more efficient and effective.

Career Highlights

Joe Holubka is currently employed at Ford Global Technologies, LLC, where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing bonding technologies within the automotive industry.

Collaborations

Holubka has collaborated with notable colleagues, including Larry Paul Haack and Ann Marie Straccia, contributing to a dynamic and innovative work environment.

Conclusion

Joe Holubka's contributions to the field of bonding technologies, particularly through his patented methods, highlight his role as a key innovator in the industry. His work continues to influence advancements in glass substrate bonding.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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