Jochen Geerk

Title: Jochen Geerk: Innovator in Epitaxial and Electron Beam Technologies

Introduction

Jochen Geerk is a notable inventor based in Stutensee, Germany. He has made significant contributions to the field of epitaxial growth and electron beam technologies. With a total of 2 patents to his name, Geerk's work is recognized for its innovative approaches and practical applications.

Latest Patents

Geerk's latest patents include a process and apparatus for producing epitaxial and/or highly textured films. The first patent describes a method for creating a high-Tc oxide superconductor on a substrate using an ablation process triggered by pulsed particles or laser beams. This process allows for the deposition of small droplets on a heated substrate, resulting in a uniform smooth film. The second patent focuses on a generator for pulsed electron beams, which includes a vacuum chamber for high voltage discharges and an arrangement for generating an auxiliary discharge. This technology is essential for irradiating samples with accelerated charge carriers.

Career Highlights

Jochen Geerk is currently employed at Kernforschungszentrum Karlsruhe GmbH, where he continues to advance his research and development efforts. His work has been instrumental in enhancing the capabilities of electron beam technologies and epitaxial growth processes.

Collaborations

Throughout his career, Geerk has collaborated with notable colleagues, including Fritz Ratzel and Christoph Schultheiss. These partnerships have contributed to the success of his projects and the advancement of their shared fields of expertise.

Conclusion

Jochen Geerk is a distinguished inventor whose work in epitaxial and electron beam technologies has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to pushing the boundaries of technology.