The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 1991
Filed:
Sep. 15, 1989
Abstract
A process for producing an epitaxial and/or highly texturized grown film, free of foreign phases, of a high-T.sub.c -oxide superconductor on a substrate, in which an ablation process is triggered and maintained on a spender target by means of pulsed particles or a laser beams, and the thus developing small droplets are deposited on a heated substrate. The substrate is held at a temperature at which the droplets on impact wet the substrate and coagulate into a uniform smooth film. An apparatus for this process comprises an electron source which produces a pulsed electron beam with an electron energy of about 10 to 20 keV and a current density in the range of 10.sup.3 to 10.sup.4 A/cm.sup.2.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile