Ranst, Belgium

Joannes Verheijen

This inventor holds 1 USPTO granted patent. Top assignee: Agfa Gevaert Nv. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joannes Verheijen. Retrieved from https://idiyas.com/inventor/joannes-verheijen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Joannes Verheijen: Innovator in Photographic Materials

Introduction

Joannes Verheijen is a notable inventor based in Ranst, Belgium. He has made significant contributions to the field of photographic materials, particularly through his innovative patent.

Latest Patents

Verheijen holds a patent for a photographic material comprising a copolyester support. This invention includes at least one silver halide emulsion layer and a copolyester support, which features polyether groups in the side chain. The copolyester is prepared by copolycondensing diol moieties that include a polyether group substituted with a sulfonic acid group in either acid or salt form.

Career Highlights

Joannes Verheijen is associated with Agfa Gevaert NV, a company known for its expertise in imaging technology. His work has contributed to advancements in photographic materials, enhancing the quality and performance of photographic products.

Collaborations

Throughout his career, Verheijen has collaborated with notable colleagues, including August M. Marien and Marc P. Stevens. These collaborations have fostered innovation and development in the field of photographic technology.

Conclusion

Joannes Verheijen's contributions to photographic materials through his innovative patent demonstrate his commitment to advancing imaging technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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