This inventor holds 1 USPTO granted patent. Top assignee: Advanced Micro Devices Corporation. Active years: 1998.
Company Filing History:
Years Active: 1998
Title: JoAnn Grimley: Innovator in Surface Conditioning Technology
Introduction
JoAnn Grimley is a notable inventor based in Santa Clara, CA (US). She has made significant contributions to the field of surface conditioning technology, particularly in the realm of insulating layers for conductive patterns. Her innovative approach has led to the development of a patented solution that addresses common challenges in electronic manufacturing.
Latest Patents
JoAnn holds a patent for a "Surface conditioning insulating layer for fine line conductive pattern." This invention involves the treatment of an insulating layer with ammonium hydroxide and hydrogen peroxide. The process effectively reduces the frequency of shorting between conductive lines in subsequently formed conductive patterns, enhancing the reliability of electronic devices.
Career Highlights
JoAnn Grimley is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. Her work at AMD has allowed her to apply her expertise in innovative technologies that drive advancements in microelectronics. With her patent, she has established herself as a key contributor to the development of more efficient manufacturing processes.
Collaborations
JoAnn collaborates with her coworker, Eddie Lee, who shares her commitment to innovation in the field. Together, they work on projects that aim to push the boundaries of technology and improve product performance.
Conclusion
JoAnn Grimley's contributions to surface conditioning technology exemplify her dedication to innovation in the semiconductor industry. Her patented work not only addresses critical challenges but also paves the way for future advancements in electronic manufacturing.