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Years Active: 2012-2014
Title: Joan K Bosworth: Innovator in Nanotechnology
Introduction
Joan K Bosworth is a prominent inventor based in San Jose, CA, known for her contributions to the field of nanotechnology. With a total of 2 patents, she has made significant strides in developing advanced lithographic techniques.
Latest Patents
Her latest patents focus on supporting membranes on nanometer-scale self-assembled films. Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure includes a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across the upper ends of the plurality of nanostructures. Other systems and methods are disclosed as well.
Career Highlights
Throughout her career, Joan has worked with notable companies such as Hitachi Global Storage Technologies and HGST Netherlands. Her work has contributed to advancements in storage technologies and nanofabrication techniques.
Collaborations
Joan has collaborated with several professionals in her field, including Elizabeth Ann Dobisz and Ricardo Ruiz. These collaborations have further enhanced her innovative projects and research.
Conclusion
Joan K Bosworth's work in nanotechnology and her innovative patents highlight her significant impact on the field. Her contributions continue to pave the way for future advancements in lithographic techniques and nanostructure development.