Kelkheim, Germany

Joachim Motz

This inventor holds 1 USPTO granted patent. Top assignee: Krupp Uhde Gmbh. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joachim Motz. Retrieved from https://idiyas.com/inventor/joachim-motz-p45939u8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Joachim Motz

Introduction

Joachim Motz is a notable inventor based in Kelkheim, Germany. He has made significant contributions to the field of chemical engineering, particularly in the production processes of various compounds. His work has been recognized through the granting of a patent, showcasing his innovative approach to industrial chemistry.

Latest Patents

Joachim Motz holds a patent for a "Process for the production of 1,2-dichloroethane." This invention highlights his expertise in developing efficient methods for chemical production, which is crucial for various applications in the chemical industry. The patent reflects his commitment to advancing technology in this field.

Career Highlights

Motz is currently employed at Krupp Uhde GmbH, a company known for its engineering and technology solutions in the chemical sector. His role at the company allows him to apply his innovative ideas and contribute to the development of new processes that enhance production efficiency and sustainability.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Joachim Motz's contributions to the field of chemical engineering, particularly through his patent and work at Krupp Uhde GmbH, demonstrate his innovative spirit and dedication to advancing industrial processes. His achievements serve as an inspiration for future inventors in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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