Joachim Krumrey

Title: Innovations of Joachim Krumrey

Introduction

Joachim Krumrey is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, Krumrey's work focuses on advanced processes for coating substrates and the development of semiconductor components.

Latest Patents

Krumrey's latest patents include a process for coating a substrate. This innovative process creates a texture on a portion of the substrate's surface, allowing a first layer to adhere better to the textured area than to the surrounding surface. The method ensures that the textured layer maintains its surface properties even when heated. Another significant patent involves semiconductor components, which feature a highly-doped substrate and a Schottky junction. This design achieves a low temperature coefficient and low forward voltage, enhancing the performance of semiconductor devices.

Career Highlights

Krumrey is currently associated with Micronas GmbH, where he continues to push the boundaries of semiconductor technology. His expertise in the field has led to advancements that benefit various applications in electronics.

Collaborations

Krumrey collaborates with Günter Igel, contributing to the innovative environment at Micronas GmbH. Their combined efforts have resulted in significant technological advancements.

Conclusion

Joachim Krumrey's contributions to semiconductor technology and coating processes highlight his role as a leading inventor in the field. His patents reflect a commitment to innovation and excellence in engineering.