Bremen, Germany

Joachim Kaiser

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Eads Deutschland Gmbh. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joachim Kaiser. Retrieved from https://idiyas.com/inventor/joachim-kaiser-4e1zu7vb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Joachim Kaiser: Inventor of a Radome with an Integrated Plasma Shutter

Introduction

Joachim Kaiser is an inventor associated with Bremen, Germany. His recorded patent work includes an antenna radome designed to selectively shield an antenna using an integrated plasma shutter. Kaiser is associated with EADS Deutschland GmbH.

Latest Patents

Kaiser’s listed patent, “Radome with Integrated Plasma Shutter,” describes a radome covering an antenna and a method for selectively shielding it. The design uses a honeycomb core containing a plasma-guiding layer, sandwiched between cover plates. Electrodes arranged to excite the plasma are transparent to high-frequency signals, at least within the antenna’s operating frequency range. The patent abstract describes the invention’s features but does not define or limit the full scope of the invention. Kaiser is credited with 1 patent in the provided information.

Career Highlights

Kaiser’s recorded invention addresses the integration of plasma-based shielding into an antenna radome. The design combines a plasma-guiding layer and high-frequency-transparent electrodes within a honeycomb structure.

Collaborations

The provided information names Robert Sekora and Herbert Zippold as Kaiser’s coworkers. It does not specify their roles in developing or patenting the radome.

Conclusion

Joachim Kaiser’s listed patent presents a radome design that integrates a selectively activated plasma shutter while accommodating the antenna’s operating frequencies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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