Company Filing History:
1 out of 164,197 
1 out of 52 Years Active: 1994-2007
Title: The Innovations of Jiunn Tsay
Introduction
Jiunn Tsay is a notable inventor based in San Jose, CA, with a focus on advancements in lithographic processes. He holds 2 patents that showcase his expertise in the field of photo-definition and mask technology. His contributions have significantly impacted the efficiency and accuracy of wafer processing.
Latest Patents
One of Jiunn Tsay's latest patents is titled "System and method for charge-balanced, continuous-write mask and wafer process for improved colinearity." This innovation introduces a charge-balanced, continuous-write mask and wafer process that transforms the magneto resistive photo-definition step into a two-mask operation. Critical images are written on one mask layer using a very small electron beam spot size, while non-critical images are written on a second mask layer with a larger spot size. This method ensures that both mask layers are accurately positioned on the same glass substrate, enhancing the precision of the critical mask layer.
Another significant patent is "Phase-shifting transparent lithographic mask for writing contiguous." This invention involves a plurality of noncontiguous polygonal regions of phase-shifting material, which have edges spaced apart less than the distance at which images of those edges would separate. The edges can have differing angular orientations, allowing for flexible fabrication and writing of phase-shifting regions in arbitrary patterns. This innovation also includes connective phase-shifting regions that create a continuous body of photoresist upon exposure, enhancing the overall image intensity.
Career Highlights
Jiunn Tsay has worked with prominent companies in the technology sector, including IBM and Hitachi Global Storage Technologies. His experience in these organizations has contributed to his development as an inventor and has provided him with a platform to innovate in the field of lithography.
Collaborations
Throughout his career, Jiunn Tsay has collaborated with talented individuals such as Phillip Joe Brock and Jacqlynn A Franklin. These collaborations have likely enriched his work and contributed to the success of his inventions.
Conclusion
Jiunn Tsay's contributions to the field of lithography through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry, showcasing the importance of creativity and collaboration in the realm of inventions.