Company Filing History:
1 out of 22 
1 out of 832,880 Years Active: 2002-2003
Title: The Innovations of Jiun-Yu Lai
Introduction
Jiun-Yu Lai is an accomplished inventor based in Waltham, MA (US). He holds a total of 2 patents that contribute significantly to the field of microelectronics manufacturing. His work primarily focuses on chemical mechanical polishing techniques, which are essential for the fabrication of semiconductor devices.
Latest Patents
One of his latest patents is titled "Chemical mechanical polishing of copper-oxide damascene structures." This patent describes a method for chemical mechanical polishing of a metal damascene structure that includes an insulation layer with trenches on a wafer and a metal layer. The method consists of two main steps: the first step involves planarizing the upper portion of the metal layer, while the second step polishes the insulation layer and the lower portion of the metal layer. This innovative approach promotes an increased metal removal rate and minimizes dishing of the metal lines.
Another significant patent is the "Method of chemical mechanical polishing." This patent addresses the challenges in the Chemical Mechanical Polishing (CMP) process by proposing three contact regimes between the wafer surface and the polishing pad. It emphasizes the need for an effective in situ method for characterizing the wafer/pad contact and relates contact conditions to process parameters. The research includes developing models that correlate the friction coefficient with applied pressure, relative velocity, and slurry viscosity, thereby enhancing the understanding of the CMP process.
Career Highlights
Jiun-Yu Lai has worked with notable companies, including ASML US, Inc. His contributions to the field have been recognized through his innovative patents and research efforts. His work has had a lasting impact on the microelectronics industry, particularly in improving manufacturing processes.
Collaborations
Throughout his career, Jiun-Yu Lai has collaborated with esteemed colleagues, including Hilario L Oh and Nannaji Saka. These collaborations have further enriched his research and development efforts in the field of chemical mechanical polishing.
Conclusion
Jiun-Yu Lai's contributions to the field of microelectronics through his innovative patents and collaborative efforts highlight his significant role as an inventor. His work continues to influence the manufacturing processes essential for semiconductor technology.