This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Industrial Technology Research Institute. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Innovations of Jiun-Ji Chen in Photosensitive Resins
Introduction
Jiun-Ji Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resins. His innovative work has led to the creation of a unique resin that exhibits both UV-curable and alkaline-soluble properties.
Latest Patents
Jiun-Ji Chen holds a patent for a "Photosensitive phosphorylated phenol-formaldehyde resin and method for preparing the same." This invention discloses a photosensitive phosphorylated phenol-formaldehyde resin characterized by containing at least two phosphate groups in its molecule, each coupled with at least one photo-sensitive group. The preparation method involves reacting a phenol-formaldehyde resin with phosphorus oxychloride to form a phosphorylated resin. This resin is then reacted with a compound having one hydroxyl group and at least one ethylenically unsaturated bond, leading to the production of a resin with ethylenically unsaturated bonds and unreacted phosphorochloridate groups. The unreacted groups are hydrolyzed into phosphoric groups, resulting in a resin that not only retains traditional photosensitive properties but also exhibits excellent flame retardant and adhesive characteristics.
Career Highlights
Jiun-Ji Chen is affiliated with the Industrial Technology Research Institute, where he continues to advance research in innovative materials. His work has garnered attention for its practical applications in various industries, particularly in areas requiring durable and effective adhesive solutions.
Collaborations
Jiun-Ji Chen collaborates with esteemed colleagues, including Ching-Sheng Cho and Shinn-Jen Chang, who contribute to the research and development of advanced materials. Their combined expertise enhances the potential for groundbreaking innovations in the field.
Conclusion
Jiun-Ji Chen's contributions to the development of photosensitive resins represent a significant advancement in material science. His innovative approach and collaborative efforts continue to pave the way for future innovations in this domain.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile