Robbinsville, NJ, United States of America

Jiun-Chen Way

This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Company. Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Jiun-Chen Way

Introduction

Jiun-Chen Way is a notable inventor based in Robbinsville, NJ (US). He has made significant contributions to the field of conductive polymers, showcasing his expertise and innovative spirit. His work has implications for various applications in materials science and engineering.

Latest Patents

Jiun-Chen Way holds a patent for a method titled "Preparing conductive polymers in the presence of emulsion latexes." This patent describes a process for preparing an intrinsically conductive copolymer. The method involves creating an emulsion latex in a medium and forming a mixture that includes at least one cyclic heteroatom-containing monomer. The process is designed to maintain the emulsion latex in a stabilized state while allowing the monomer to polymerize, resulting in a conductive copolymer. The additives used in this process include cyclodextrins, partially alkylated cyclodextrins, poly(vinyl alcohol), partially hydrolyzed poly(vinyl acetate), and poly(vinyl acetate).

Career Highlights

Jiun-Chen Way is currently employed at Rohm and Haas Company, where he continues to innovate and develop new materials. His work at the company has allowed him to explore the potential of conductive polymers and their applications in various industries.

Collaborations

One of his notable collaborators is Edward E La Fleur. Their partnership has contributed to advancements in the field of conductive materials.

Conclusion

Jiun-Chen Way's contributions to the field of conductive polymers highlight his innovative approach and dedication to advancing material science. His patent and work at Rohm and Haas Company demonstrate the impact of his research on future technologies.

Profile summary based on public USPTO records.
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