Jiun-Chan Yang

Title: **Innovator Spotlight: Jiun-Chan Yang**

Introduction

Jiun-Chan Yang is a renowned inventor based in Portland, Oregon. She is recognized for her contributions to the field of interconnect structures within semiconductor technology. With a focus on enhancing thin seed conduction, her innovative work has led to significant advancements in substrate interconnect methodologies.

Latest Patents

Jiun-Chan Yang holds a patent titled "Methods of forming substrate interconnect structures for enhanced thin seed conduction." This patent outlines various methods and structures for forming substrate tap structures. The techniques include creating a plurality of conductive interconnect structures on an epitaxial layer located on a substrate. The design ensures that individual conductive interconnect structures are positioned adjacent to each other. Furthermore, it describes the formation of a portion of a seed layer on at least one of the conductive interconnect structures and the development of a conductive trace on the seed layer.

Career Highlights

Currently, Jiun-Chan Yang is employed at Intel Corporation, a leading company in the semiconductor industry. Her role involves developing innovative solutions that contribute to the efficiency and functionality of electronic devices. Her expertise is pivotal in advancing the state of semiconductor technologies, influencing how devices are designed and manufactured.

Collaborations

Throughout her career, Jiun-Chan Yang has collaborated with esteemed colleagues, including Christopher J. Jezewski and Radek P. Chalupa. These partnerships have played a significant role in pushing the boundaries of technology and fostering an environment of innovation at Intel Corporation.

Conclusion

Jiun-Chan Yang is an inspiring figure in the realm of innovation, with her patent reflecting her dedication to advancing technology. Her work in developing methodologies for substrate interconnect structures demonstrates the impact that such innovations can have on the semiconductor industry. With her continued efforts at Intel Corporation, she is sure to contribute more groundbreaking advancements in the years to come.