Hsinchu, Taiwan

Jium-Ming Lin


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011-2024

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4 patents (USPTO):

Title: Jium-Ming Lin: Innovator in Semiconductor Technology

Introduction

Jium-Ming Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His innovative work has had a considerable impact on the industry.

Latest Patents

Among his latest patents is a wafer stacking structure and manufacturing method. This invention includes an interlayer, a first wafer, and a second wafer. The interlayer features a first surface and a second surface opposite to the first surface. It comprises a dielectric material layer and a redistribution layer embedded within the dielectric material layer. The first wafer is positioned on the first surface of the interlayer, while the second wafer is placed on the second surface. The second wafer is electrically connected to the first wafer through the redistribution layer of the interlayer. Another notable patent is a method and system for selecting base stations to position a mobile device. This method involves selecting multiple base station sets from a plurality of base stations, utilizing artificial neural networks to optimize the selection and positioning of the mobile device.

Career Highlights

Jium-Ming Lin has worked with notable companies in the semiconductor industry, including Novatek Microelectronics Corporation and Powerchip Semiconductor Manufacturing Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Some of his coworkers include Chien-Sheng Chen and Yung-Chuan Lin. Their collaboration has contributed to the advancement of technology in their respective fields.

Conclusion

Jium-Ming Lin is a distinguished inventor whose work in semiconductor technology continues to influence the industry. His patents reflect his commitment to innovation and excellence in engineering.

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