Hwaseong, South Korea

Jiseong Doh

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiseong Doh. Retrieved from https://idiyas.com/inventor/jiseong-doh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Jiseong Doh - Innovator in Semiconductor Technology

Introduction

Jiseong Doh is an inventor based in Suwon-si, South Korea. He is focused on advancements in semiconductor technology. Although he currently holds no granted patents, his work in the field is noteworthy.

Latest Patent Applications

Jiseong Doh has submitted several innovative patent applications. One of his latest applications is titled "METHOD OF INSPECTING SEMICONDUCTOR PROCESS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING THE SAME." This method involves obtaining a measurement value of a semiconductor device and a simulation value of a virtual semiconductor device based on input data about the manufacturing process. The process includes comparing these values and providing information about predicted defect-causing factors.

Another significant application is "AUTOMATED SIMULATION METHOD BASED ON DATABASE IN SEMICONDUCTOR DESIGN PROCESS, AUTOMATED SIMULATION GENERATION DEVICE AND SEMICONDUCTOR DESIGN AUTOMATION SYSTEM PERFORMING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME." This method determines the suitability of a target recipe set for manufacturing a semiconductor device. It involves deep learning and simulation to predict defects and assess the manufacturing process.

Conclusion

Jiseong Doh is making strides in semiconductor technology through his innovative patent applications. His work has the potential to significantly impact the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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